| 摘要 |
A gas analysis device (10) is provided with: first and second laser beam sources (11, 12) which output first and second laser beams; a laser control means (11) which controls the first and second laser beam sources such that the wavelengths of the first and second laser beams change in predetermined wavelength ranges, respectively; a multiplexing means (15, 17) which mixes the first laser beam and the second laser beam to irradiate gas to be measured therewith; a light reception means (19) which receives a laser beam transmitted through the gas to be measured; and an analysis means (23) which, on the basis of an electric signal from the light reception means, analyzes the temperature and/or concentration of the gas to be measured. When changing the wavelengths of the laser beams, the laser control means (14) makes the magnitude of the amplitude of the first laser beam and the magnitude of the amplitude of the second laser beam different from each other, and changes the intensity of the first laser beam and the intensity of the second laser beam in opposite directions. |
