发明名称 |
INTEGRATED CIRCUIT INCLUDING WIRE STRUCTURE AND RELATED METHOD |
摘要 |
An integrated circuit (IC), design structure, and a method of making the same. In one embodiment, the IC includes: a substrate; a dielectric layer disposed on the substrate; a set of wire components disposed on the dielectric layer, the set of wire components including a first wire component disposed proximate a second wire component; a bond pad disposed on the first wire component, the bond pad including an exposed portion; a passivation layer disposed on the dielectric layer about a portion of the bond pad and the set of wire components, the passivation layer defining a wire structure via connected to the second wire component; and a wire structure disposed on the passivation layer proximate the bond pad and connected to the second wire component through the wire structure via. |
申请公布号 |
US2015056799(A1) |
申请公布日期 |
2015.02.26 |
申请号 |
US201414519614 |
申请日期 |
2014.10.21 |
申请人 |
International Business Machines Corporation |
发明人 |
Cooney, III Edward C.;Gambino Jeffrey P.;He Zhong-Xiang;Leidy Robert K. |
分类号 |
H01L21/768;H01L23/00 |
主分类号 |
H01L21/768 |
代理机构 |
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代理人 |
|
主权项 |
1. A method, comprising:
forming a dielectric layer on a substrate; forming a metal layer on the dielectric layer; forming a set of wire components from the metal layer, the set of wire components including a first wire component proximate a second wire component; depositing a bond pad on the first wire component; forming a passivation layer on the dielectric layer and about portions of the set of wire components, the passivation layer including a wire component via connected to the second wire component; and forming a wire structure above the second wire component and physically isolated from the bond pad. |
地址 |
Armonk NY US |