发明名称 INTEGRATED CIRCUIT INCLUDING WIRE STRUCTURE AND RELATED METHOD
摘要 An integrated circuit (IC), design structure, and a method of making the same. In one embodiment, the IC includes: a substrate; a dielectric layer disposed on the substrate; a set of wire components disposed on the dielectric layer, the set of wire components including a first wire component disposed proximate a second wire component; a bond pad disposed on the first wire component, the bond pad including an exposed portion; a passivation layer disposed on the dielectric layer about a portion of the bond pad and the set of wire components, the passivation layer defining a wire structure via connected to the second wire component; and a wire structure disposed on the passivation layer proximate the bond pad and connected to the second wire component through the wire structure via.
申请公布号 US2015056799(A1) 申请公布日期 2015.02.26
申请号 US201414519614 申请日期 2014.10.21
申请人 International Business Machines Corporation 发明人 Cooney, III Edward C.;Gambino Jeffrey P.;He Zhong-Xiang;Leidy Robert K.
分类号 H01L21/768;H01L23/00 主分类号 H01L21/768
代理机构 代理人
主权项 1. A method, comprising: forming a dielectric layer on a substrate; forming a metal layer on the dielectric layer; forming a set of wire components from the metal layer, the set of wire components including a first wire component proximate a second wire component; depositing a bond pad on the first wire component; forming a passivation layer on the dielectric layer and about portions of the set of wire components, the passivation layer including a wire component via connected to the second wire component; and forming a wire structure above the second wire component and physically isolated from the bond pad.
地址 Armonk NY US