发明名称 PHOTORESIST FILM WITH ADHESIVE LAYER AND MICROSPHERES
摘要 The present invention provides, in at least one embodiment, a film and method for engraving objects. The film includes an adhesive layer configured to allow the film to be easily repositionable on the surface of an object. For example, the film can be shifted, rotated, or moved prior to pressure being applied and before the engraving. Additionally, the photoresist layer includes microspheres comprising small pockets of air which strengthen the photoresist layer by bouncing the engraving blast away and allow the photoresist layer to advantageously be designed thinner.
申请公布号 US2015056414(A1) 申请公布日期 2015.02.26
申请号 US201313975581 申请日期 2013.08.26
申请人 Rayzist Photomask, Inc. 发明人 Willis Randy;Willis Josh
分类号 B44C1/22 主分类号 B44C1/22
代理机构 代理人
主权项 1. A film comprising: an adhesive layer configured to be attached to a substrate or an object, wherein the adhesive layer is configured to allow repositioning on the object prior to applying pressure to the adhesive layer and prior to engraving and the adhesive layer is configured to remain fixed to an object after applying pressure to the adhesive layer and during engraving, wherein the adhesive layer comprises a pressure sensitive adhesive; a membrane layer attached to the adhesive layer; and a photoresist layer attached to the membrane layer, the photoresist layer having a design cutout portion and a non-cutout portion, wherein the non-cutout portion resists the engraving.
地址 Vista CA US