HIGH THROUGHPUT SEM TOOL

摘要

PROBLEM TO BE SOLVED: To provide a multi-beam scanning electron beam device to inspect a wafer pattern.SOLUTION: A multi-beam scanning electron beam device is described. The multi-beam scanning electron beam device having a column, includes: a multi-beam emitter for emitting a plurality of electron beams; at least one common electron beam optical element having a common opening for at least two of the plurality of electron beams and being adapted for commonly influencing at least two of the plurality of electron beams; at least one individual electron beam optical element for individually influencing the plurality of electron beams; a common objective lens assembly for focusing the plurality of electrons beams having a common excitation for focusing at least two of the plurality of electron beams, and adapted for focusing the plurality of electron beams onto a specimen for generation of a plurality of signal beams; and a detection assembly for individually detecting each signal beam on a corresponding detection element.