发明名称 ENGINEERED SUBSTRATES HAVING MECHANICALLY WEAK STRUCTURES AND ASSOCIATED SYSTEMS AND METHODS
摘要 <p>Engineered substrates having mechanically weak structures for separating substrates from epitaxially grown semiconductor structures and associated systems and methods are disclosed herein. In several embodiments, for example, an engineered substrate can be manufactured by forming an intermediary material at an upper surface of a structural material and forming a plurality of pores in the intermediary material. The porous intermediary material and the structural material can define a handle substrate. The method can further include bonding an epitaxial formation structure on the handle substrate such that the porous intermediary material is between the epitaxial formation structure and the structural material. In various embodiments, the porous intermediary material is configured to break under mechanical stress.</p>
申请公布号 WO2015026699(A1) 申请公布日期 2015.02.26
申请号 WO2014US51434 申请日期 2014.08.18
申请人 MICRON TECHNOLOGY, INC. 发明人 KILBURY, OLIVER, J.;SCHUBERT, MARTIN, F.;FREI, JEREMY, S.
分类号 H01L21/20;H01L33/00 主分类号 H01L21/20
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