| 发明名称 |
LITHOGRAPHIC APPARATUS AND A METHOD OF OPERATING THE APPARATUS |
| 摘要 |
A lithographic projection apparatus is disclosed which includes a cleaning station. Several embodiments of the cleaning station are disclosed. In an embodiment, measures are taken to avoid contact of a cleaning fluid with the final element of the projection system. In an embodiment, measures are taken to avoid foaming of the cleaning fluid. The use of a thermally isolated island is also disclosed as well as its optimal position. |
| 申请公布号 |
US2015055102(A1) |
申请公布日期 |
2015.02.26 |
| 申请号 |
US201414473643 |
申请日期 |
2014.08.29 |
| 申请人 |
ASML NETHERLANDS B.V. |
发明人 |
WATSO Robert Douglas;Van Dommelen Youri Johannes Laurentius Maria;Jacobs Johannes Henricus Wilhelmus;Jansen Hans;Leenders Martinus Hendrikus Antonius;Mertens Jeroen Johannes Sophia Maria;Steijaert Peter Paul;De Jong Antonius Martinus Cornelis Petrus;Van De Winkel Jimmy Matheus Wilhelmus;Da Paz Sena Joao Paulo;Van Der Lee Maurice Martinus Johannes;Van Lier Henricus Martinus Dorotheus;Tanasa Gheorghe |
| 分类号 |
G03F7/20 |
主分类号 |
G03F7/20 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. An immersion lithographic apparatus, comprising:
an inlet configured to introduce a cleaning fluid into a space, a surface to be cleaned at least in part defining the space; and a liquid seal configured to seal around at least part of the space to hinder fluid surrounding the space from entering the space. |
| 地址 |
Veldhoven NL |
