发明名称 |
METHOD FOR FORMING INTEGRATED CIRCUITS ON A STRAINED SEMICONDUCTOR SUBSTRATE |
摘要 |
An electronic circuit on a strained semiconductor substrate, includes: electronic components on a first surface of a semiconductor substrate; and at least portions of a layer of a porous semiconductor material on the side of a second surface of the semiconductor substrate, opposite to the first surface, to bend the semiconductor substrate. |
申请公布号 |
US2015054141(A1) |
申请公布日期 |
2015.02.26 |
申请号 |
US201414533770 |
申请日期 |
2014.11.05 |
申请人 |
STMicroelectronics (Crolles 2) SAS |
发明人 |
Bensahel Daniel-Camille;Halimaoui Aomar |
分类号 |
H01L29/78 |
主分类号 |
H01L29/78 |
代理机构 |
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代理人 |
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主权项 |
1. A strained integrated device structure comprising:
integrated devices formed at a first surface of a semiconductor substrate; porous semiconductor material formed at a first surface of a semiconductor support, wherein the semiconductor support is bonded to a second surface of the semiconductor substrate; and a region of strained semiconductor located between the porous semiconductor material and the integrated devices. |
地址 |
Crolles FR |