发明名称 POWER SEMICONDUCTOR DEVICE AND FABRICATION METHOD THEREOF
摘要 A power semiconductor device includes a cell region on a semiconductor substrate, at least a transistor device in the cell region, a peripheral termination region encompassing the cell region, a plurality of epitaxial islands arranged around the cell region, and a grid type epitaxial layer in the peripheral termination region. The grid type epitaxial layer separates the plurality of epitaxial islands from one another.
申请公布号 US2015054062(A1) 申请公布日期 2015.02.26
申请号 US201414509071 申请日期 2014.10.08
申请人 Anpec Electronics Corporation 发明人 Lin Yung-Fa;Chang Chia-Hao
分类号 H01L29/06;H01L29/49;H01L29/40;H01L29/78;H01L27/088 主分类号 H01L29/06
代理机构 代理人
主权项 1. A power semiconductor device, comprising: a cell region on a semiconductor substrate; at least one transistor device disposed in the cell region; a peripheral termination region surrounding the cell region; a plurality of islands of first epitaxial layer disposed in the peripheral termination region; and a grid-shaped second epitaxial layer in the peripheral termination region, the grid-shaped second epitaxial layer surrounds each of the plurality of islands of first epitaxial layer to thereby separate the plurality of islands of first epitaxial layer from one another.
地址 Hsin-Chu TW
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