| 发明名称 |
EXPOSURE APPARATUS, EXPOSURE METHOD, AND EXPOSURE PROGRAM |
| 摘要 |
According to one embodiment, a scan control unit, a focus control unit, and a focus control region setting unit are provided. The scan control unit performs scan control of exposure light on an XY plane, the focus control unit performs focus control of the exposure light, and the focus control region setting unit sets a focus control region such that focus control ranges in an X-axis direction and in a Y-axis direction on the XY plane are different each other. |
| 申请公布号 |
US2015055105(A1) |
申请公布日期 |
2015.02.26 |
| 申请号 |
US201414197726 |
申请日期 |
2014.03.05 |
| 申请人 |
Kabushiki Kaisha Toshiba |
发明人 |
IWANAKA Koji;MIWA Taisuke |
| 分类号 |
G03F7/20 |
主分类号 |
G03F7/20 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. An exposure apparatus comprising:
a scan control unit configured to perform scan control of exposure light on an XY plane; a focus control unit configured to perform focus control of the exposure light; and a focus control region setting unit configured to set a focus control region such that focus control ranges in an X-axis direction and in a Y-axis direction on the XY plane are different each other. |
| 地址 |
Minato-ku JP |
