发明名称 PHOTOCURABLE COMPOSITION
摘要 <p>PROBLEM TO BE SOLVED: To provide a fast-curing type photocurable composition that can be cured in a short time even with low integral luminous energy and has a curing delay property and excellent adhesiveness, workability and coating film properties, and to provide a photocurable composition giving a sufficient curing rate even in a high humidity environment.SOLUTION: The photocurable composition comprises (A) a crosslinking silicon group-containing (meth)acrylic polymer, (B) an epoxy compound having at least two epoxy groups in the molecule, (C) an oxetane compound having a hydroxyl group and one oxetanyl group, and (D) a photo-cation polymerization initiator.</p>
申请公布号 JP2015038182(A) 申请公布日期 2015.02.26
申请号 JP20130216732 申请日期 2013.10.17
申请人 CEMEDINE CO LTD 发明人 YAMAYA HIROSHI;AKIMOTO MASAHITO;SAITO ATSUSHI;SHIMAZAKI TOMOYUKI
分类号 C08L33/00;C08G65/18;C08L63/00 主分类号 C08L33/00
代理机构 代理人
主权项
地址