| 发明名称 |
POLISHING PAD WITH POROUS INTERFACE AND SOLID CORE, AND RELATED APPARATUS AND METHODS |
| 摘要 |
Disclosed is a polishing pad for chemical-mechanical polishing. The polishing pad has a porous interface and a substantially non-porous bulk core. Also disclosed are related apparatus and methods for using and preparing the polishing pad. |
| 申请公布号 |
WO2015026614(A1) |
申请公布日期 |
2015.02.26 |
| 申请号 |
WO2014US50997 |
申请日期 |
2014.08.14 |
| 申请人 |
CABOT MICROELECTRONICS CORPORATION |
发明人 |
VACASSY, ROBERT;FOTOU, GEORGE |
| 分类号 |
H01L21/304 |
主分类号 |
H01L21/304 |
| 代理机构 |
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代理人 |
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| 主权项 |
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