| 摘要 |
<p>In order to prevent contamination of an organic film by moisture and to prevent the degradation of organic elements by moisture, a firing apparatus (3) that fires organic films formed by the coating method is provided with: a loading unit (5) for loading a substrate (4) on which an organic film has been formed; a firing unit (6) that removes solvents contained in the organic film on the substrate (4) by heating, and fires the organic film; and an unloading unit (7) for unloading the substrate (4) from the firing unit (6). The interiors of the loading unit (5), the firing unit (6) and the unloading unit (7) are partitioned from the atmosphere. As a result of this configuration, the infiltration into the fired organic film of a moisture-containing solvent component from the organic film during or before firing is prevented, thus enabling a high-quality organic film free from defects to be provided.</p> |
