| 摘要 |
<p>A manufacturing method of a mask blank and manufacturing method of a photomask are provided to prevent that smudge is drawn in a starting area of the coating film and prevent problems caused by the surface state, states of the starting place in coating. A manufacturing method of the mask blank having a resist film comprises processes: preparing for a substrate(10) having a thin film(11) for forming the mask pattern on the domain excluding a circumference portion following the periphery of the major surface of substrate; deciding the open surface of the circumference portion following the periphery of the major surface of substrate as the contact liquid initiation place; starting the contact liquid when interval of the open surface and the tip-end part of the spreading nozzle(22) is relatively small; and broadening the interval of the open surface and the tip-end part of the spreading nozzle(22) with the relatively big state and completing the contact liquid.</p> |
