发明名称 COMPOSITIONS AND METHODS USING SAME FOR FLOWABLE OXIDE DEPOSITION
摘要 Described herein are compositions or formulations for forming a film in a semiconductor deposition process, such as without limitation, a flowable chemical vapor deposition of silicon oxide. Also described herein is a method to improve the surface wetting by incorporating an acetylenic alcohol or diol surfactant such as without limitation 3,5-dimethyl-1-hexyn-3-ol, 2,4,7,9-tetramethyl-5-decyn-4,7-diol, 4-ethyl-1-octyn-3-ol, and 2,5-dimethylhexan-2,5-diol, and other related compounds.
申请公布号 US2015056822(A1) 申请公布日期 2015.02.26
申请号 US201414457397 申请日期 2014.08.12
申请人 AIR PRODUCTS AND CHEMICALS, INC. 发明人 Pearlstein Ronald Martin;Spence Daniel P.
分类号 H01L21/02 主分类号 H01L21/02
代理机构 代理人
主权项 1. A formulation comprising: (a) an organosilane precursor having a formula I comprising: R1R2R3R4Si  I wherein R1, R2, R3, and R4 are each independently selected from a hydrogen atom; a halogen atom; a C1-C12 linear or branched alkyl group; a C2-C12 alkenyl group; a C2-C12 alkynyl group; a C3-C12 aryl group; a C3-C12 cycloalkyl group; a C1-C12 alkoxy group; a C5-C12 aryloxy group; a C1 to C12 acyloxy group; a C5 to C12 aroyloxy; an isocyanato group; an amino group having the formula NR5R6 wherein R5 and R6 are independently selected from: a hydrogen atom; a C1-C6 linear or branched alkyl group; a C3 to C12 cycloalkyl group; and a C3-C12 aryl group wherein R5 and R6 are connected to form a ring or R5 and R6 are not connected to form a ring; and an alkoxysilylalkyl group having a formula selected from the group consisting of —CH2Si(OR7)nR83-n and —CH2CH2Si(OR7)nR83-n wherein R7 and R8 are independently chosen from: a hydrogen atom, a C1-C6 linear or branched alkyl group, a C3 to C12 cycloalkyl group, and a C3 to C12 aryl group wherein R7 and R8 are connected to form a ring or R7 and R8 are not connected to form a ring and wherein in the alkoxysilylalkyl group n is a number ranging from 0 to 3 and wherein the first organosilane precursor contains at least two hydrolysable bonds selected from the group consisting of Si—H, Si—O and Si—N bond; (b) optionally a second organosilane precursor selected from the group consisting of: (1) a compound having a formula III comprising: XSiR1R2R3  III wherein X is a halogen atom selected from the group consisting of F, Cl, Br, and I; and R1, R2, and R3 are each independently selected from a hydrogen atom; a halogen atom; a C1-C12 linear or branched alkyl group; a C2-C12 alkenyl group; a C2-C12 alkynyl group; a C3-C12 aryl group; a C3-C12 cycloalkyl group; a C1-C12 alkoxy group; a C5-C12 aryloxy group; a C1 to C12 acyloxy group; a C5 to C12 aroyloxy; an isocyanato group; and an alkoxysilylalkyl group having a formula selected from the group consisting of —CH2Si(OR7)nR83-n and —CH2CH2Si(OR7)nR83-n wherein R7 and R8 are independently chosen from: a hydrogen atom, a C1-C6 a linear or branched alkyl group, a C3 to C12 cycloalkyl group, and a C3 to C12 aryl group wherein R7 and R8 are connected to form a ring or R7 and R8 are not connected to form a ring and wherein in the alkoxysilylalkyl group n is a number ranging from 0 to 3 and wherein at least one of substituents R1, R2, and R3 within the second organosilane precursor forms a Si—H, Si-halogen, Si—O or Si—N bond; and (2) a compound having a formula IV comprising: (R5R6N)nSiH4-n  IV wherein R5 and R6 are independently selected from: a hydrogen atom; a C1-C6 linear or branched alkyl group; a C3 to C12 cycloalkyl group; and a C3-C12 aryl group wherein R5 and R6 are connected to form a ring or R5 and R6 are not connected to form a ring and n=1, 2, 3, or 4 and wherein at least a portion or all of the halogenation reagent reacts with the first organosilane precursor to provide the second organosilane precursor; (c) optionally a catalyst; and (d) a surfactant which is at least one selected from the group of compounds having the following formulae A through D: wherein R1 and R4 are each independently a linear or branched C3-C6 alkyl group; R2 and R3 are each independently a hydrogen atom or a linear or branched C1-C5 alkyl group; R5 is a linear or a branched C1-C6 alkyl group; W is a hydrogen atom or an C2-C12 alkynyl group; X and Y are either a hydrogen atom or a hydroxyl group; m, n are each independently a number ranging from 0 to 4; r and s are each independently 2 or 3; and i is a number ranging from 0 to 2.
地址 Allentown PA US