ETCHING LIQUID COMPOSITION AND ETCHING METHOD

摘要

The etching liquid composition of the present invention contains a ferric ion component; a hydrogen chloride component; and a component that is at least one type of compound selected from the group consisting of a compound represented by general formula (1) below and a straight chain or branched chain alcohol having 1 to 4 carbon atoms:;;wherein R1 and R3 are each independently a hydrogen atom or a straight chain or branched chain alkyl group having 1 to 4 carbon atoms, R2 is a straight chain or branched chain alkylene group having 1 to 4 carbon atoms, and n is a number between 1 and 3.

主权项

1. An etching liquid composition which is used to collectively etch a multilayer film formed of an indium oxide-based coating film and a metal-based coating film characterized in that the etching liquid composition is formed of an aqueous solution that contains:
(A) a ferric ion component; (B) a hydrogen chloride component; and (C) a component that is at least one type of compound selected from the group consisting of a compound represented by general formula (1) below and a straight chain or branched chain alcohol having 1 to 4 carbon atoms:wherein R1 and R3 are each independently a hydrogen atom or a straight chain or branched chain alkyl group having 1 to 4 carbon atoms, R2 is a straight chain or branched chain alkylene group having 1 to 4 carbon atoms, and n is a number between 1 and 3.