发明名称 |
PATTERN FORMATION METHOD, MASK FOR PATTERN FORMATION, METHOD FOR MANUFACTURING MASK, AND PATTERN FORMATION APPARATUS |
摘要 |
According to one embodiment, a pattern formation method includes: preparing a mask pattern for interference, a photoelectric conversion unit, and a processing object, the mask pattern for interference being periodically arranged a plurality of light transmissive portions, the photoelectric conversion unit being disposed apart from the mask pattern for interference; applying light to the mask pattern for interference to produce Talbot interference based on transmitted light of the light transmitted through the light transmissive portions; applying interference light produced by the Talbot interference to the photoelectric conversion unit to cause the photoelectric conversion unit to emit electrons based on the interference light; and forming a pattern by applying the electrons to the processing object. |
申请公布号 |
US2015053867(A1) |
申请公布日期 |
2015.02.26 |
申请号 |
US201314095480 |
申请日期 |
2013.12.03 |
申请人 |
KABUSHIKI KAISHA TOSHIBA |
发明人 |
INANAMI Ryoichi;Ito Shinichi;Sato Takashi |
分类号 |
H01J37/317;H01J37/22 |
主分类号 |
H01J37/317 |
代理机构 |
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代理人 |
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主权项 |
1. A pattern formation method comprising:
preparing a mask pattern for interference, a photoelectric conversion unit, and a processing object, the mask pattern for interference being periodically arranged a plurality of light transmissive portions, the photoelectric conversion unit being disposed apart from the mask pattern for interference; applying light to the mask pattern for interference to produce Talbot interference based on transmitted light of the light transmitted through the light transmissive portions; applying interference light produced by the Talbot interference to the photoelectric conversion unit to cause the photoelectric conversion unit to emit electrons based on the interference light; and forming a pattern by applying the electrons to the processing object. |
地址 |
Tokyo JP |