| 摘要 |
<p>The present invention relates to a substrate processing method of cleaning a substrate. A substrate cleaning method in a substrate processing apparatus which has multiple collation tanks where inlets which allow a process liquid to enter a substrate cleaning space are vertically stacked, includes: a step of placing a substrate on a substrate supporting member; a step of performing a chemical solution process on the substrate by supplying a chemical onto the substrate; a step of performing a rinsing process on the substrate by supplying a cleaning solution onto the substrate; a step of performing a drying process on the substrate by supplying a drying fluid onto the substrate. The drying fluid is collected by a moving collection tank among the collection tanks. The chemical is collected by a fixing collection tank among the collection tanks. The inlet of the collection tank is opened in the drying process step. The inlet of the moving collection tank is closed in the chemical process step.</p> |
