PROCEDIMIENTO PARA EL DEPOSITO DE CAPAS GRUESAS DE BORO

摘要

The invention relates to a method for depositing a layer of boron on a substrate by means of physical evaporation with an electron beam, characterised in that it comprises: a) producing a clean substrate that comprises a first adhesive layer, b) protecting the substrate, c) reaching a minimum vacuum of 5x10-6 mbar, d) heating the substrate to a minimum temperature of 115°C, e) depositing 10B by means of EBPVD without there being any boron fragments smaller than 0.25 mm and maintaining the evaporation cone focussed, f) depositing another adhesive layer on the 10B layer, and g) cooling the substrate; where steps e) and f) are performed at least once to obtain a layer of boron with a thickness equal to or higher than 1μπι. The invention also relates to the product obtained by said method and to the use thereof as a neutron detector.