发明名称 DUAL-MASK ARRANGEMENT FOR SOLAR CELL FABRICATION
摘要 An arrangement for supporting substrates during processing, having a wafer carrier with a susceptor for supporting the substrate and confining the substrate to predetermined position. An inner mask is configured for placing on top of the substrate, the inner mask having an opening pattern to mask unprocessed parts of the substrate, but expose remaining parts of the substrate for processing. An outer mask is configured for placing on top of the inner mask, the outer mask having an opening that exposes the part of the inner mask having the opening pattern, but cover the periphery of the inner mask.
申请公布号 EP2839052(A1) 申请公布日期 2015.02.25
申请号 EP20130777473 申请日期 2013.04.19
申请人 INTEVAC, INC.;BLUCK, TERRY;LATCHFORD, IAN;SHAH, VINAY;RIPOSAN, ALEX 发明人 BLUCK, TERRY;LATCHFORD, IAN;SHAH, VINAY;RIPOSAN, ALEX
分类号 C23C14/04;H01L21/673;H01L31/18 主分类号 C23C14/04
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