| 摘要 |
<p>The present invention relates to an apparatus and a method for measuring an electrical property of a film element by optical scanning, and more specifically, to an apparatus for measuring an electrical property which radiates light on a film type element having light transmission rate of a predetermined level by a scanning method and detects light transmitted or reflected in different positions of the film element to measure an electrical property of the film element; and a method thereof. The method for measuring an electrical property includes steps of: determining resistance and thickness properties of conductive films formed of same material deposited in different thicknesses; radiating light on the conductive films in which the optical properties are determined by a scanning method; obtaining optical detection profiles of the conductive films by scanning; and obtaining surface resistance values at different positions of the conductive films from the optical detection profiles based on the resistance and thickness properties of different positions on the conductive films.</p> |
