| 摘要 |
<p>PURPOSE: A treatment solution discharge device is provided to completely remove a minute liquid crystal remaining in a nozzle plane of a head. CONSTITUTION: A treatment solution discharge device comprises a base, a substrate support unit(100), a gantry(200) and a head cleaning unit. The substrate support unit is installed in the base. A substrate(S) is placed in the substrate support unit. The gantry is offered at the upper part of the movement route of the supporting substrate unit. The gantry is combined with a head(400) discharging the solution to the ink-jet method at the top of the substrate. The head cleaning unit is installed in the base. The head cleaning unit washes the nozzle plane of the head.</p> |
