发明名称 パターン形成方法およびパターン形成装置
摘要 <P>PROBLEM TO BE SOLVED: To form a small-width pattern in a large thickness, and to prevent a surface thereof in its intersection part from becoming uneven when forming the small-width pattern and a large-width pattern intersecting with each other. <P>SOLUTION: The method for forming a pattern includes a first application step S30 for linearly supplying a high-viscosity application liquid to a principal surface of a substrate to form a small-width pattern, and a second application step S50 for linearly supplying a low-viscosity application liquid onto the principal surface of the substrate and the small-width pattern to form a large-width pattern intersecting with the small-width pattern. <P>COPYRIGHT: (C)2011,JPO&INPIT
申请公布号 JP5676863(B2) 申请公布日期 2015.02.25
申请号 JP20090212787 申请日期 2009.09.15
申请人 株式会社SCREENホールディングス 发明人 古市 考次;岩島 正信;真田 雅和
分类号 H01L21/027;B05C5/02;B05D1/26;B05D7/00;H01L51/48 主分类号 H01L21/027
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