Cylindrical magnetic levitation stage and lithography

摘要

The present invention provides a cylindrical magnetic levitation stage and an exposure apparatus, which can form a nanoscale pattern of a large area directly on the surface of a large cylinder. The present invention provides an exposure apparatus including a new type of cylindrical magnetic levitation stage, which can levitate, rotate, and move a cylinder in the axial direction by the principle of magnetic levitation in a non-contact manner and form a nanoscale pattern on the surface of the cylinder, and a light source for irradiating light on the surface of the cylinder, thereby reducing the position error of the cylindrical magnetic levitation stage to a nanoscale size and correcting the error caused by mechanical processing in real time. Moreover, the present invention provides an exposure apparatus, which includes a differential vacuum means combined with the cylindrical magnetic levitation stage to create a partial vacuum environment between the light source and the surface of the cylinder, and thus it is possible to employ light sources such as X-rays, electron beams, extreme ultraviolet (EUV) rays, etc.

主权项

1. An exposure apparatus for forming a nanoscale pattern directly on the surface of a cylinder, the exposure apparatus comprising:
a cylindrical magnetic levitation stage installed in a chamber; a light source installed at the top of a cylindrical mold in the chamber; and a differential vacuum unit installed at the top of the cylindrical mold and having a spherical or non-spherical bottom to create a partial vacuum environment between the light source and the cylindrical mold, the cylindrical magnetic levitation stage comprising: a cylinder operating unit for rotation and a cylinder operating unit for linear movement, which support both sides of a cylindrical mold and is rotated and linearly moved by magnetic levitation force and magnetic moving force generated by the interaction between permanent magnets and electromagnets; and a cylinder fixing unit for rotation and a cylinder fixing unit for linear movement, which are disposed at the bottom of the cylinder operating unit for rotation and the cylinder operating unit for linear movement, respectively, to support the cylindrical operating units in a non-contact manner, wherein a vacuum pressure of the differential vacuum unit is controlled such that the distance between the light source and the cylindrical mold is finely controllable.