发明名称 |
Photodiode and method for making the same |
摘要 |
A method for manufacturing a photodiode including the steps of providing a substrate, solution depositing a quantum nanomaterial layer onto the substrate, the quantum nanomaterial layer including a number of quantum nanomaterials having a ligand coating, and applying a thin-film oxide layer over the quantum nanomaterial layer. |
申请公布号 |
US8962378(B2) |
申请公布日期 |
2015.02.24 |
申请号 |
US201213549905 |
申请日期 |
2012.07.16 |
申请人 |
The Boeing Company |
发明人 |
Euliss Larken E.;Granger G. Michael;Davis Keith J.;Abueg Nicole L.;Brewer Peter D.;Nosho Brett |
分类号 |
H01L21/00 |
主分类号 |
H01L21/00 |
代理机构 |
Walters & Wasylyna LLC |
代理人 |
Walters & Wasylyna LLC |
主权项 |
1. A method for manufacturing a photodiode comprising steps of:
providing a substrate comprising germanium; doping said substrate; subjecting said substrate to sulfur passivation; cleaning said substrate after said sulfur passivation; solution depositing a quantum nanomaterial layer onto said substrate, said quantum nanomaterial layer comprising a plurality of quantum nanomaterials, each quantum nanomaterial of said plurality comprising:
a core comprising at least one of tin-telluride and lead-tin-telluride which is tuned to absorb radiation within a bandwidth of mid-wavelength infrared and long-wavelength infrared; anda ligand coating on said core comprising a metal chalcogenide complex comprising at least one of tin-sulfide, tin-selenide and tin-telluride, wherein said ligand coating is applied to said core using a ligand exchange reaction to substitute an original coating on said core; and applying a thin-film oxide layer over said quantum nanomaterial layer. |
地址 |
Chicago IL US |