发明名称 Organosiliconate powders, method for the production thereof and use thereof for hydrophobizing mineral building materials
摘要 Solid alkali metal salts of organosilanols and/or their hydrolysis/condensation products are prepared by hydrolysis of organosilanes in water and in the presence of a basic alkali metal salt. The products contain predominately methyl and ethyl organic groups, and C4 or higher hydrocarbon groups as well. The solid salts effectively hydrophobe building materials, while being easily mixed with water.
申请公布号 US8961672(B2) 申请公布日期 2015.02.24
申请号 US201214119114 申请日期 2012.05.07
申请人 Wacker Chemie AG 发明人 Stepp Michael;Auer Dominik;Felix Karl-Heinz;Schildbach Daniel
分类号 C04B41/49;C07F7/08;C07F7/18;C04B24/42;C04B41/00;C04B41/64;C04B28/02;C04B28/14 主分类号 C04B41/49
代理机构 Brooks Kushman P.C. 代理人 Brooks Kushman P.C.
主权项 1. Solid salts of organo radical-containing organosilanols, of their hydrolysis/condensation products, or of organo radical-containing organosilanols together with their hydrolysis/condensation products, with alkali metal cations, wherein the molar ratio of cation to silicon is 0.5 to 3, wherein at least 1 mol % and not more than 99 mol % of the organo radicals are selected from the group consisting of methyl and ethyl radicals and mixtures thereof, and organo radicals other than methyl and ethyl radicals contain at least 4 C atoms, produced by a process, comprising: in a first step, hydrolyzing organosilanes of the formula 1 (R1)aSi(Y)b(—Si(R2)3-c(Y)c)d  (1)or their hydrolysis/condensation products, or the organosilanes of the formula 1 together with their hydrolysis/condensation products, where R1 and R2 are each a monovalent, Si—C-bonded C1-30 hydrocarbon radical which is unsubstituted or is substituted by halogen atoms, amino groups, thiol groups or C1-6 alkyl- or C1-6 alkoxy-substituted silyl groups, in which one or more nonadjacent —CH2— units are optionally replaced by groups —O—, —S—, or —NR3—, and in which one or more nonadjacent ═CH— units are optionally replaced by groups —N═, R3 is hydrogen or a monovalent C1-8 hydrocarbon radical which is unsubstituted or substituted by halogen atoms or NH2 groups, Y is H, F, Cl, Br, or OR4, R4 is a monovalent C1-10 hydrocarbon radical which is unsubstituted or substituted by halogen atoms or silyl groups, in which one or more nonadjacent CH2 units are optionally replaced by groups —O—, —S—, or —NR3—, and in which one or more nonadjacent ═CH— units are optionally replaced by groups —N═, a is 1, 2 or 3, and b, c, and d are 0, 1, 2 or 3, with the proviso that b+c≧1 and a+b+d=4, in the presence of water and basic salt of alkali metal cations, the amount of basic salt being calculated such that per mole of silicon there is 0.5 mol to 3 mol of cations, and, if the organosilanes of the formula 1 contain F, Cl, and/or Br radicals, a further mole of basic salt is present per mole of F, Cl, and Br, and in a second step, removing liberated compound(s) HY, in the form of gas, in a third step, removing water present in the mixture, and in a fourth step, isolating the salt in the form of a solid, wherein at least 1% and not more than 99% of the radicals R1 and R2 are methyl and/or ethyl radicals and radicals R1 and R2 which are not methyl or ethyl radicals contain at least 4 C atoms.
地址 Munich DE