| 发明名称 | Continuous generation of extreme ultraviolet light | ||
| 摘要 | The generation of EUV light includes rotating a cylinder at least partially coated with a plasma-forming target material, directing pulsed illumination to a first set of helically-arranged spots traversing a material-coated portion of the rotating cylinder in a first direction and directing pulsed illumination to a second set of helically-arranged spots traversing the material-coated portion of the rotating cylinder in a second direction, the pulsed illumination being suitable for exciting the plasma-forming target material. | ||
| 申请公布号 | US8963110(B2) | 申请公布日期 | 2015.02.24 |
| 申请号 | US201414309393 | 申请日期 | 2014.06.19 |
| 申请人 | KLA-Tencor Corporation | 发明人 | Hale Layton;Chilese Francis;Zhang Qiang Q. |
| 分类号 | H01J35/20;H05G2/00;G01N21/95;G03F7/20 | 主分类号 | H01J35/20 |
| 代理机构 | Suiter Swantz pc llo | 代理人 | Suiter Swantz pc llo |
| 主权项 | 1. A method of generating continuous or near-continuous plasma-based illumination comprising: rotating a cylinder at least partially coated with a plasma-forming target material; directing pulsed illumination to a first set of helically-arranged spots traversing a material-coated portion of the rotating cylinder in a first direction; and directing the pulsed illumination to a second set of helically-arranged spots traversing the material-coated portion of the rotating cylinder in a second direction, the pulsed illumination being suitable for exciting the plasma-forming target material. | ||
| 地址 | Milpitas CA US | ||