| 发明名称 | Nano-structured surface | ||
| 摘要 | A method of forming a nano-structured substrate is provided, the method comprising including forming non-integral nano-pillars on a substrate surface and directionally etching the substrate surface using the non-integral nano-pillars as a mask to form integral nano-structures in the substrate. | ||
| 申请公布号 | US8961799(B2) | 申请公布日期 | 2015.02.24 |
| 申请号 | US201113878203 | 申请日期 | 2011.10.13 |
| 申请人 | Hewlett-Packard Development Company, L.P. | 发明人 | Mardilovich Peter;Fuller Anthony M.;Wei Qingqiao |
| 分类号 | B44C1/22;B82Y40/00;B81C1/00 | 主分类号 | B44C1/22 |
| 代理机构 | Hewlett-Packard Patent Development | 代理人 | Hewlett-Packard Patent Development |
| 主权项 | 1. A method of forming a nano-structured substrate, the method comprising: forming a template on a substrate surface, the template comprising elongate nano-pores with substantially uniform cross-sectional shapes along a length of the nano-pores; forming non-integral nano-pillars on the substrate surface, the non-integral nano-pillars comprising elongate upper portions having shapes conforming to the cross-sectional shapes of the elongate nano-pores; and directionally etching the substrate surface using the non-integral nano-pillars as a mask to form integral nano-structures in the substrate. | ||
| 地址 | Houston TX US | ||