发明名称 System and methods for semiconductor device performance prediction during processing
摘要 Methods and systems for predicting semiconductor device performance criteria during processing. A method is described that includes receiving a semiconductor wafer; performing semiconductor processing on the semiconductor wafer forming active devices that, when completed, will exhibit a device performance criteria; during the semiconductor processing, measuring in line at least one device performance criteria related physical parameter; projecting an estimated value for the device performance criteria of the active devices using the at least one in line measurement and using estimated measurements for device performance criteria related physical parameters corresponding to later semiconductor processing steps; comparing the estimated value for the device performance criteria to an acceptable range; and determining, based on the comparing, whether the active devices on the semiconductor wafer will have a device performance criteria within the acceptable range. A system for processing semiconductor wafers that includes a programmable processor for performing the methods is described.
申请公布号 US8962353(B2) 申请公布日期 2015.02.24
申请号 US201113234964 申请日期 2011.09.16
申请人 Taiwan Semiconductor Manufacturing Company, Ltd. 发明人 Wang Jen-Pan;Chen Chao-Chi;Huang Yaling
分类号 H01L21/66 主分类号 H01L21/66
代理机构 Slater & Matsil, L.L.P. 代理人 Slater & Matsil, L.L.P.
主权项 1. A method, comprising: receiving a semiconductor wafer for semiconductor processing to form active devices thereon; performing semiconductor processing on the semiconductor wafer forming active devices that, when completed, will exhibit a device performance criteria; during the semiconductor processing and prior to completing the forming the active devices on the semiconductor wafer, measuring in line at least one physical parameter of the active devices, wherein the at least one physical parameter is related to a performance criteria of the active devices at completion; projecting an estimated value for the device performance criteria of the active devices using the at least one in line measurement and using estimated measurements for device performance criteria related physical parameters corresponding to semiconductor processing steps that are yet to be performed on the semiconductor wafer; comparing the estimated value for the device performance criteria to an acceptable range; determining, based on the comparing, whether the active devices on the semiconductor wafer will have a device performance criteria within the acceptable range when the semiconductor wafer is completed; and based on the determining, continuing the above steps of performing semiconductor processing, measuring, projecting, determining, until the semiconductor processing is complete for the same semiconductor wafer.
地址 Hsin-Chu TW