Plasma processing apparatus and plasma processing method

摘要

Provided are a plasma processing apparatus and a plasma processing method wherein particles generated due to the inner potential of an inner cylinder disposed inside of a vacuum container are reduced. The plasma processing apparatus has, inside of a metal vacuum chamber (11), the inner cylinder (15) composed of a surface-alumited aluminum, disposes a substrate in a plasma diffusion region, and performs plasma processing. A plurality of protruding portions (15a) in point-contact with the vacuum chamber (11) are provided on the lower end portion of the inner cylinder (15), the alumite film (16) on the leading end portion (15b) of each of the protruding portion (15a) is removed, and the inner cylinder and the vacuum chamber (11) are electrically connected to each other.

主权项

1. A plasma processing apparatus, comprising:
an inner tube made of aluminum having an anodized surface, the inner tube is provided inside a metal vacuum chamber and in which plasma processing is performed with a substrate disposed in a plasma diffusion region; a gas nozzle which is made of aluminum having an anodized surface and which is provided in an inner side wall of the vacuum chamber and disposed to penetrate a through-hole provided in the inner tube; a protruding portion having a leading end is provided in the through-hole of the inner tube, the leading end of the protruding portion in point-contact with the gas nozzle is not provided with the anodized aluminum, and a surface of a portion of the gas nozzle in point-contact with the protruding portion of the inner tube and in a surface of a portion of the gas nozzle in contact with the vacuum chamber is not provided with the anodized aluminum so that the inner tube is electrically conductive with the vacuum chamber.