发明名称 |
Fe-Co BASED ALLOY SPUTTERING TARGET MATERIAL, SOFT MAGNETIC THIN FILM LAYER AND PERPENDICULAR MAGNETIC RECORDING MEDIUM USING SOFT MAGNETIC THIN FILM LAYER |
摘要 |
PROBLEM TO BE SOLVED: To provide: an Fe-Co based alloy sputtering target material capable of stably performing magnetron sputtering without generating particles for soft magnetic film formation; a method for manufacturing the same; a soft magnetic thin film layer; and a perpendicular magnetic recording medium using the soft magnetic thin film layer.SOLUTION: The sputtering target material made of Fe-Co based alloy includes one kind or two kinds or more of Nb, Ta, Mo and W as an M element and the remainder consisting of one kind or two kinds of Fe and Co and inevitable impurities and satisfies a following formula (1) having atomic ratios of 0≤X≤100 and 4≤Y≤28. The micro-structure of the sputtering target material has a phase mainly containing Fe and Co and an intermetallic compound phase consisting of one kind or two kinds of Fe and Co and the M element. The phase mainly containing Fe and Co is divided by the intermetallic compound phase consisting of one kind or two kinds of Fe and Co and the M element. (Fe-Co)M(1) |
申请公布号 |
JP2015036453(A) |
申请公布日期 |
2015.02.23 |
申请号 |
JP20130168787 |
申请日期 |
2013.08.15 |
申请人 |
SANYO SPECIAL STEEL CO LTD |
发明人 |
HASEGAWA HIROYUKI;SAWADA TOSHIYUKI;MATSUBARA YOSHIAKI |
分类号 |
C23C14/34;C22C19/07;C22C38/00;G11B5/667;G11B5/851 |
主分类号 |
C23C14/34 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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