发明名称 Fe-Co BASED ALLOY SPUTTERING TARGET MATERIAL, SOFT MAGNETIC THIN FILM LAYER AND PERPENDICULAR MAGNETIC RECORDING MEDIUM USING SOFT MAGNETIC THIN FILM LAYER
摘要 PROBLEM TO BE SOLVED: To provide: an Fe-Co based alloy sputtering target material capable of stably performing magnetron sputtering without generating particles for soft magnetic film formation; a method for manufacturing the same; a soft magnetic thin film layer; and a perpendicular magnetic recording medium using the soft magnetic thin film layer.SOLUTION: The sputtering target material made of Fe-Co based alloy includes one kind or two kinds or more of Nb, Ta, Mo and W as an M element and the remainder consisting of one kind or two kinds of Fe and Co and inevitable impurities and satisfies a following formula (1) having atomic ratios of 0≤X≤100 and 4≤Y≤28. The micro-structure of the sputtering target material has a phase mainly containing Fe and Co and an intermetallic compound phase consisting of one kind or two kinds of Fe and Co and the M element. The phase mainly containing Fe and Co is divided by the intermetallic compound phase consisting of one kind or two kinds of Fe and Co and the M element. (Fe-Co)M(1)
申请公布号 JP2015036453(A) 申请公布日期 2015.02.23
申请号 JP20130168787 申请日期 2013.08.15
申请人 SANYO SPECIAL STEEL CO LTD 发明人 HASEGAWA HIROYUKI;SAWADA TOSHIYUKI;MATSUBARA YOSHIAKI
分类号 C23C14/34;C22C19/07;C22C38/00;G11B5/667;G11B5/851 主分类号 C23C14/34
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