| 摘要 |
PROBLEM TO BE SOLVED: To provide lithography techniques advantageous to productivity.SOLUTION: A lithographic apparatus includes: a shield part including a shield member having an aperture formed on it and having a first edge and a second edge for regulating the aperture to shield the substrate by a shield area of the shield member including either one of the first edge and the second edge for a peripheral area of the substrate; a drive mechanism including a rotating mechanism for rotating the shield member and a translation mechanism for translating the shield member to change the shield area of the substrate by the shield member; and a control part for controlling the drive mechanism so as to successively perform first pattern formation on a peripheral shot area from a peripheral shot area corresponding to a position of one end of a rotation range of the rotating mechanism up to a peripheral shot area corresponding to a position of the other end of the rotation range by using the shield area including the first edge and then successively perform second pattern formation on the peripheral shot area from the peripheral shot area corresponding to the position of the other end up to the peripheral shot area corresponding to the position of the one-end by using the shield area including the second edge. |
