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发明名称
用于微显影蚀刻术之照明光学机构
摘要
申请公布号
TWI474125
申请公布日期
2015.02.21
申请号
TW097147987
申请日期
2008.12.10
申请人
卡尔蔡司SMT有限公司
发明人
安卓斯 马汀;史塔特柔 罗勒夫;欧司马 珍斯
分类号
G03F7/20;G03B27/72
主分类号
G03F7/20
代理机构
代理人
李宗德 台北市大安区敦化南路2段218号5楼A区
主权项
一种用于微显影蚀刻术的照明光学机构,包含:一光学总成用以将照明光导引至一物体平面中之一要被照明的物体场;其中该照明光学机构会将一照明光辐射束分成多数的辐射次束,它们系被指配于该物体场照明的不同照明角度;其中该照明光学机构系构制成会使至少某些该等辐射次束被重叠于一叠合平面中,其系相隔于该物体平面,且其不会显像于该发生叠合的物体平面中,而会使该等重叠的辐射次束之外部边缘部分全部地重合。
地址
德国
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