| 摘要 |
<p>PROBLEM TO BE SOLVED: To provide an alignment mark formation method capable of reducing an area for disposing a plurality of alignment marks of different dimensions.SOLUTION: A first alignment mark is formed by forming droplets from a thin film material and discharging the droplets, and coating and hardening the thin film material on a substrate. On the substrate on which the first alignment mark is formed, by forming droplets from a thin film material and discharging the droplets, and coating and hardening the thin film material, a second alignment mark that is included in the first alignment mark or includes the first alignment mark in a plan view is formed.</p> |
