| 摘要 |
<p>PROBLEM TO BE SOLVED: To provide a substrate cleaning device capable of cleaning an outer periphery part of a substrate, which is held, as much as possible, and to provide a substrate processing device.SOLUTION: A substrate cleaning device 10 includes: a substrate rotation device 11 having a holding part 11a which holds the outer periphery part of a substrate W at multiple positions set at an interval, the substrate rotation device 11 which rotates the substrate W held by the holding part 11a; cleaning members 13s, 15s which clean the substrate W rotated by the substrate rotation device 11; a cam 18 which rotates in synchronization with the substrate rotation device 11, the cam 18 which guides the cleaning member 15s so that the cleaning member 15s cleaning the substrate W detours the holding part 11a. The cam 18 causes the cleaning member 15s cleaning the substrate W to detour the holding part 11a, and thus the substrate cleaning device 10 is able to clean most of the outer periphery portion of the substrate W while rotating the substrate W which is held at the outer periphery part.</p> |
