SUBSTRATE PROCESSING APPARATUS AND SEMICONDUCTOR DEVICE PRODUCING METHOD

摘要

Disclosed is a substrate processing apparatus, including: a processing chamber for processing a substrate; a substrate rotating mechanism for rotating the substrate; a gas supply unit for supplying gas to the substrate, at least two kinds of gases A and B being alternately supplied a plurality of times to form a desired film on the substrate; and a controller for controlling a rotation period of the substrate or a gas supply period defined as a time period between an instant when the gas A is made to flow and an instant when the gas A is made to flow next time such that the rotation period and the gas supply period are not brought into synchronization with each other at least while the alternate gas supply is carried out predetermined times.

主权项

1. A method of manufacturing a semiconductor device, comprising:
providing a substrate; and processing the substrate with the substrate being rotated and processing gas being periodically supplied to the substrate, wherein a supply cycle of the processing gas and a rotation period of the substrate do not come into synchronization with each other at least during a predetermined period in the processing of the substrate.