| 发明名称 |
RETAINER RING STRUCTURE FOR CHEMICAL-MECHANICAL POLISHING MACHINE |
| 摘要 |
A retainer ring structure for a chemical-mechanical polishing (CMP) machine includes: a upper ring made of metal and having a plurality of bolt holes formed on the top surface thereof and coupled to a head of the CMP machine; and a lower ring made of resin and having a coupling groove formed in the center thereof and coupled to the upper ring, wherein the upper ring and the lower ring are coupled to each other such that the top surface of the upper ring and the circumferential top surface of the lower ring are positioned on the same plane. |
| 申请公布号 |
US2015050870(A1) |
申请公布日期 |
2015.02.19 |
| 申请号 |
US201313965369 |
申请日期 |
2013.08.13 |
| 申请人 |
CNUS CO., LTD. |
发明人 |
KIM Bu Soon;CHOI Heung Sun |
| 分类号 |
B24B37/32 |
主分类号 |
B24B37/32 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. A retainer ring structure for a chemical-mechanical polishing (CMP) machine, comprising:
a upper ring made of metal and having a plurality of bolt holes formed on the top surface thereof and coupled to a head of the CMP machine; and a lower ring made of resin and having a coupling groove formed in the center thereof and coupled to the upper ring, wherein the upper ring and the lower ring are coupled to each other such that the top surface of the upper ring and the circumferential top surface of the lower ring are positioned on the same plane. |
| 地址 |
Gyeonggi-do KR |
