TOTAL PITCH ADJUSTMENT METHOD AND APPARATUS FOR SUBSTRATE

摘要

A total pitch adjustment apparatus for a substrate comprises: obtaining a total pitch change value of a substrate sample according to a final total pitch measurement value of the substrate sample on which all exposure processes are implemented and an expected final total pitch value of the substrate; adjusting, according to the total pitch change value, first-layer total pitch initial reference coordinates in a first-layer exposure process of the substrate to be exposed, so as to obtain adjusted first-layer total pitch reference coordinates of the substrate to be exposed; and performing a first-layer exposure process on the to-be-exposed substrate according to the adjusted first-layer total pitch reference coordinates. In this manner, the final total pitch has no obvious change compared with a total pitch before process parameters such as a thermal process are changed, or the change quantity is tiny. The accuracy of cell alignment of an array substrate and a color film substrate during cell alignment of liquid crystal cells is achieved by using simple and feasible operations.