发明名称 RETAINER RING STRUCTURE FOR CHEMICAL-MECHANICAL POLISHING MACHINE AND METHOD FOR MANUFACTURING THE SAME
摘要 A retainer ring structure for a chemical-mechanical polishing (CMP) machine includes: an insert ring made of metal and having a plurality of holes formed at the top surface thereof and coupled to a head of the CMP machine; an insert pin made of resin, including a body having a hollow portion of which the top surface is opened and one or more elongated grooves formed at side surfaces thereof in a longitudinal direction, and press-fitted into a hole of the insert ring so as to be subjected to a tapping process; and an outer ring formed to surround the insert pin and the insert ring.
申请公布号 US2015050869(A1) 申请公布日期 2015.02.19
申请号 US201313965354 申请日期 2013.08.13
申请人 CNUS CO., LTD. 发明人 KIM Bu Soon;CHOI Heung Sun
分类号 B24B37/32 主分类号 B24B37/32
代理机构 代理人
主权项 1. A retainer ring structure for a chemical-mechanical polishing (CMP) machine, comprising: an insert ring made of metal and having a plurality of holes formed at the top surface thereof and coupled to a head of the CMP machine; an insert pin made of resin, comprising a body having a hollow portion of which the top surface is opened and one or more elongated grooves formed at side surfaces thereof in a longitudinal direction, and press-fitted into a hole of the insert ring so as to be subjected to a tapping process; and an outer ring formed to surround the insert pin and the insert ring.
地址 Gyeonggi-do KR