发明名称 |
RETAINER RING STRUCTURE FOR CHEMICAL-MECHANICAL POLISHING MACHINE AND METHOD FOR MANUFACTURING THE SAME |
摘要 |
A retainer ring structure for a chemical-mechanical polishing (CMP) machine includes: an insert ring made of metal and having a plurality of holes formed at the top surface thereof and coupled to a head of the CMP machine; an insert pin made of resin, including a body having a hollow portion of which the top surface is opened and one or more elongated grooves formed at side surfaces thereof in a longitudinal direction, and press-fitted into a hole of the insert ring so as to be subjected to a tapping process; and an outer ring formed to surround the insert pin and the insert ring. |
申请公布号 |
US2015050869(A1) |
申请公布日期 |
2015.02.19 |
申请号 |
US201313965354 |
申请日期 |
2013.08.13 |
申请人 |
CNUS CO., LTD. |
发明人 |
KIM Bu Soon;CHOI Heung Sun |
分类号 |
B24B37/32 |
主分类号 |
B24B37/32 |
代理机构 |
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代理人 |
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主权项 |
1. A retainer ring structure for a chemical-mechanical polishing (CMP) machine, comprising:
an insert ring made of metal and having a plurality of holes formed at the top surface thereof and coupled to a head of the CMP machine; an insert pin made of resin, comprising a body having a hollow portion of which the top surface is opened and one or more elongated grooves formed at side surfaces thereof in a longitudinal direction, and press-fitted into a hole of the insert ring so as to be subjected to a tapping process; and an outer ring formed to surround the insert pin and the insert ring. |
地址 |
Gyeonggi-do KR |