发明名称 TUNNEL FIELD-EFFECT TRANSISTOR, METHOD FOR MANUFACTURING SAME, AND SWITCH ELEMENT
摘要 A tunnel field-effect transistor (TFET) is configured by disposing a III-V compound semiconductor nano wire on a (111) plane of a IV semiconductor substrate exhibiting p-type conductivity, and arbitrarily disposing electrodes of a source, drain and gate. Alternatively, the tunnel field-effect transistor is configured by disposing a III-V compound semiconductor nano wire on a (111) plane of a IV semiconductor substrate exhibiting n-type conductivity, and arbitrarily disposing electrodes of a source, drain and gate. The nano wire is configured from a first region and a second region. For instance, the first region is intermittently doped with a p-type dopant, and the second region is doped with an n-type dopant.
申请公布号 WO2015022777(A1) 申请公布日期 2015.02.19
申请号 WO2014JP04175 申请日期 2014.08.12
申请人 NATIONAL UNIVERSITY CORPORATION HOKKAIDO UNIVERSITY;JAPAN SCIENCE AND TECHNOLOGY AGENCY 发明人 FUKUI, TAKASHI;TOMIOKA, KATSUHIRO
分类号 H01L21/336;B82Y30/00;B82Y40/00;H01L21/28;H01L29/06;H01L29/417;H01L29/66;H01L29/78 主分类号 H01L21/336
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