| 摘要 |
An aerosol deposition system that uses a liquid ink fed directly to an ultrasonic source at or near a nozzle to form an aerosolized ink, which may be transported via a carrier gas to a sheath gas insertion location is presented. The sheath gas may direct or focus the atomized ink through a nozzle. Alternatively, a deposition head may be adapted to the ultrasonic source so that aerosolization of the ink occurs inside the deposition head, where the sheath gas flows around the ultrasonic source, transporting the aerosolized ink through a nozzle and toward a substrate ~2 mm distant. The substrate may be translated to form features of controlled shape such as lines with widths from ≤30 μm to 100 μm. Variations of this system may yield systems where a carrier gas is unnecessary, and all aerosolized ink is transported via the sheath gas. |
