发明名称 |
RECURSIVE PUMPING FOR SYMMETRICAL GAS EXHAUST TO CONTROL CRITICAL DIMENSION UNIFORMITY IN PLASMA REACTORS |
摘要 |
Embodiments of the present invention provide apparatus and methods for reducing non-uniformity and/or skews during substrate processing. One embodiment of the present invention provides a flow equalizer assembly for disposing between a vacuum port and a processing volume in a processing chamber. The flow equalizing assembly includes a first plate having at least one first opening, and a second plate having two or more second openings. The first and second plates define a flow redistributing volume therebetween, and the at least one first opening and the two or more second openings are staggered. |
申请公布号 |
WO2015023435(A1) |
申请公布日期 |
2015.02.19 |
申请号 |
WO2014US48843 |
申请日期 |
2014.07.30 |
申请人 |
APPLIED MATERIALS, INC. |
发明人 |
SHOJI, SERGIO, FUKUDA;NOORBAKHSH, HAMID;KIM, JONG, MUN;ROSA, JASON, DELLA;BALAKRISHNA, AJIT |
分类号 |
H01L21/02;H01L21/203;H01L21/205 |
主分类号 |
H01L21/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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