PROCESS LIQUID FOR SUPPRESSING MICROSTRUCTURE PATTERN COLLAPSE AND PROCESS OF MANUFACTURING MICROSTRUCTURE USING THE SAME

摘要

PROBLEM TO BE SOLVED: To provide a process liquid capable of suppressing pattern collapse of a microstructure such as a semiconductor device and a micro-machine, and to provide a process of manufacturing a microstructure using the same.SOLUTION: Processing is performed using a process liquid for suppressing pattern collapse of a metal microstructure containing phosphate ester having an alkyl group with a carbon number of 8 to 24 or an alkenyl group with a carbon number of 8 to 24 and/or polyoxyalkylene ether phosphate ester or salt thereof and water and a water-soluble solvent.