发明名称 NOZZLE, CLEANING APPARATUS AND CLEANING METHOD
摘要 [Problem] To suppress metal contamination that occurs, after cleaning, on a cleaned surface of a substrate due to scraping of a nozzle path inner wall. [Solution] According to one embodiment of the present invention, a nozzle (11) from which CO2 particles are to be jetted to a substrate is characterized in that a hard film having a Vickers hardness of Hv 1,000-5,000 is formed on an inner wall of the nozzle (11).
申请公布号 WO2015022732(A1) 申请公布日期 2015.02.19
申请号 WO2013JP71882 申请日期 2013.08.13
申请人 YOUTEC CO., LTD. 发明人 UJIIE TSUTOMU;HONDA YUUJI
分类号 B08B7/00 主分类号 B08B7/00
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