PATTERN LENGTH MEASUREMENT DEVICE AND PATTERN LENGTH MEASUREMENT METHOD

摘要

PROBLEM TO BE SOLVED: To provide a pattern length measurement device whose number of components is small.SOLUTION: A pattern length measurement device according to the present invention includes: an electron source that generates a primary electron beam; a deflector that deflects the primary electron beam emitted from the electron source; a converging lens that converges the primary electron beam deflected by the deflector; deceleration means for decelerating the primary electron beam to be irradiated on a specimen; a first detector that is positioned between the electron source and the converging lens and detects electrons at some azimuth angles among electrons generated from the specimen through the irradiation with the primary electron beam; and a second detector that is positioned between the electron source and the first detector and detects the electrons at almost all azimuth angles among the electrons generated from the specimen.