发明名称 COIL UNIT FOR THIN FILM INDUCTOR, MANUFACTURING METHOD OF COIL UNIT FOR THIN FILM INDUCTOR, THIN FILM INDUCTOR AND MANUFACTURING METHOD OF THIN FILM INDUCTOR
摘要 Embodiments of the invention provide a coil unit for a thin film inductor, a manufacturing method of a coil unit for a thin film inductor, a thin film inductor, and a manufacturing method of a thin film inductor. According to an embodiment, there is provided a coil unit for a thin film inductor. The coil unit includes an insulator having a dual insulating layer of different materials, and coil patterns respectively embedded in upper and lower surfaces of the insulator. The coil patterns include a coil pattern formed of a plurality of plating layers.
申请公布号 US2015048918(A1) 申请公布日期 2015.02.19
申请号 US201414460022 申请日期 2014.08.14
申请人 SAMSUNG ELECTRO-MECHANICS CO., LTD. 发明人 PARK Jeong Woo;KANG Seon Ha;LEE Oh Hi
分类号 H01F27/28;H01F41/04 主分类号 H01F27/28
代理机构 代理人
主权项 1. A coil unit for a thin film inductor, comprising: an insulator comprising a dual insulating layer of different materials; and coil patterns respectively embedded in upper and lower surfaces of the insulator, wherein the coil patterns comprise a coil pattern formed of a plurality of plating layers.
地址 Gyeonggi-do KR