发明名称 |
COIL UNIT FOR THIN FILM INDUCTOR, MANUFACTURING METHOD OF COIL UNIT FOR THIN FILM INDUCTOR, THIN FILM INDUCTOR AND MANUFACTURING METHOD OF THIN FILM INDUCTOR |
摘要 |
Embodiments of the invention provide a coil unit for a thin film inductor, a manufacturing method of a coil unit for a thin film inductor, a thin film inductor, and a manufacturing method of a thin film inductor. According to an embodiment, there is provided a coil unit for a thin film inductor. The coil unit includes an insulator having a dual insulating layer of different materials, and coil patterns respectively embedded in upper and lower surfaces of the insulator. The coil patterns include a coil pattern formed of a plurality of plating layers. |
申请公布号 |
US2015048918(A1) |
申请公布日期 |
2015.02.19 |
申请号 |
US201414460022 |
申请日期 |
2014.08.14 |
申请人 |
SAMSUNG ELECTRO-MECHANICS CO., LTD. |
发明人 |
PARK Jeong Woo;KANG Seon Ha;LEE Oh Hi |
分类号 |
H01F27/28;H01F41/04 |
主分类号 |
H01F27/28 |
代理机构 |
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代理人 |
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主权项 |
1. A coil unit for a thin film inductor, comprising:
an insulator comprising a dual insulating layer of different materials; and coil patterns respectively embedded in upper and lower surfaces of the insulator, wherein the coil patterns comprise a coil pattern formed of a plurality of plating layers. |
地址 |
Gyeonggi-do KR |