SCANNING ION MICROSCOPE AND SECONDARY PARTICLE CONTROL METHOD

摘要

The present invention is provided to enable a detailed inspection of a specimen and preventing a distortion of an observation image even when a specimen containing an insulating material is partially charged. For a scanning ion microscope utilizing a gas field ionization ion source, a thin film is disposed between an ion optical system and a specimen, and an ion beam is applied to and transmitted through this thin film in order to focus a neutralized beam on the specimen. Furthermore, an electrode for regulating secondary electrons discharged from this thin film is provided in order to eliminate mixing of noises into an observation image.

主权项

1. A scanning ion microscope comprising:
an ion source; a specimen stage configured to hold a specimen; an ion optical system configured to cause ions emitted from the ion source converge on the specimen and make deflection of the converged ions to a given position on the specimen; an ion controller configured to control the ion optical system; a secondary particle detector configured to detect a secondary particle emitted from the specimen; and an image processing unit configured to form an image in which by a signal from the secondary particle detector corresponds to the deflection of the converged ions, and store the image in a storage unit and displays the image on a display unit; wherein the scanning ion microscope further comprises: a support member, which is electrically-conductive, configured to support a thin film which is irradiated with the ions, is disposed between the ion optical system and the specimen; and a potential control unit configured to control a first electric potential, which is an electric potential of the support member.