| 发明名称 |
RUTHENIUM COMPOUND HAVING SUPERIOR STEP COVERAGE AND THIN FILM DEPOSITED USING SAME |
| 摘要 |
The present invention relates to a ruthenium compound including a specific ligand structure of 1-ethyl-1,4-cyclohexadiene, 1,3-butadiene or isoprene and having superior thermal stability, vaporizing property and step coverage, and a thin film deposited using same. |
| 申请公布号 |
US2015050431(A1) |
申请公布日期 |
2015.02.19 |
| 申请号 |
US201214351930 |
申请日期 |
2012.03.30 |
| 申请人 |
Park Jung Woo;Kim Jun Young;Lee Kwang deok;Jin Whee Won |
发明人 |
Park Jung Woo;Kim Jun Young;Lee Kwang deok;Jin Whee Won |
| 分类号 |
C23C16/455;C23C16/50;C23C16/448;C23C16/18 |
主分类号 |
C23C16/455 |
| 代理机构 |
|
代理人 |
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| 主权项 |
|
| 地址 |
Seoul KR |
