| 发明名称 |
SEMICONDUCTOR STRUCTURE AND MANUFACTURING METHOD THEREOF |
| 摘要 |
A semiconductor structure includes a surface having a plurality of portions and a dielectric material over the surface. The dielectric material includes an aspect ratio substantially equal to or greater than a predetermined value. |
| 申请公布号 |
US2015048477(A1) |
申请公布日期 |
2015.02.19 |
| 申请号 |
US201313968726 |
申请日期 |
2013.08.16 |
| 申请人 |
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD. |
发明人 |
TSAI JIA-YOU;LEE KUNG-WEI |
| 分类号 |
H01L29/06;H01L21/762 |
主分类号 |
H01L29/06 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. A semiconductor structure, comprising:
a surface including a plurality of portions; a dielectric material over the surface, wherein the dielectric material includes an aspect ratio that is substantially equal to or greater than a predetermined value. |
| 地址 |
Hsinchu TW |
