| 摘要 |
<p>Provided is a method for producing a semiconductor light-emitting element having a current blocking layer, wherein it is possible to form a current blocking layer of various shapes on various positions on the layer without involving an etching process. Also provided are a semiconductor light-emitting element obtained by means of said method for producing a semiconductor light-emitting element, and a photosensitive composition used in said method for producing a semiconductor light-emitting element. The method for producing a semiconductor light-emitting element having a current blocking layer involves forming a pattern which can be obtained from the photosensitive composition by means of the lithography method, and is characterized in that said pattern becomes the current blocking layer.</p> |
