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发明名称
Verfahren zum Herstellen von Siliciumdioxidfilmen
摘要
申请公布号
DE1771145(A1)
申请公布日期
1971.11.25
申请号
DE19681771145
申请日期
1968.04.10
申请人
MATSUSHITA ELECTRONICS CORP.
发明人
IWASA,HITOO;YOKOZAWA,MASAMI;TERMAMOTO,IWAO
分类号
C23C16/40;H01L21/316
主分类号
C23C16/40
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代理人
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